An EUV Lithography mask, a fabrication method, and use method thereof is provided.

本发明提供了一种EUV光刻掩模、其制造方法与其使用方法。

The general EUV sources, discharge produced plasma (DPP) and laser produced plasma (LPP), were compared in many respects.

对国际上普遍采用的两种EUV光源：放电等离子体源(DPP)和激光等离子体源(LPP)进行了多方面比较。

EUV masks are automatically transferred into and out of the dual pod; the inner pod can be stored inside the InSync environment.

EUV掩膜板被自动送入和送出双盒容器(Dual pod)中；其中内层盒可以储存在InSync系统的环境下。

The space observation successes in solar long wave radio, X-ray, EUV. research results from those observations are investigated in this paper.

本文着重探讨了太阳空间长波射电观测、X射线观测、紫外线观测的成就与研究结果。

Reflective optical elements based on multilayer coatings are have entered the practical stage that take EUV lithography and EUV astrophysics as the core.

目前，基于极紫外多层膜的反射式光学元件，已经全面进入了以极紫外光刻与极紫外天文观测为核心的实用化阶段。

All materials have strong absorption in EUV region. Therefore, using multilayer coatings is the only approach to construct normal incidence optical systems.

在极紫外波段，任何材料都存在严重的吸收，因此采用多层膜实现高反射率，是构建正入射式光学系统的唯一途径。

Nikon is not shipping standalone EUV tools. Instead, the company has devised two R&D tools, including one within its headquarters in Japan and another at Japanese R&D organization Selete.

而尼康则目前还没有独立式EUV光刻机上市，不过这家公司制造了两台研发用EUV光刻设备，其中一台放在尼康日本总部使用，而另外一台则供给日本的一个研究组织Selete使用。